Mechanism of silicon etching in HF-KMnO4-H2O solution

Korean Journal of Chemical Engineering 1995 / 04 Vol. 12; Iss. 2

Mechanism of silicon etching in HF-KMnO4-H2O solution

Kee Suk Nahm, Young Hun Seo
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Volume:
12
Language:
english
Pages:
6
DOI:
10.1007/bf02705641
Date:
April, 1995
File:
PDF, 891 KB
english, 1995
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