High-Resolution, High-Throughput, Positive-Tone Patterning...

PLoS ONE 2013 / 5 Vol. 8; Iss. 5

High-Resolution, High-Throughput, Positive-Tone Patterning of Poly(ethylene glycol) by Helium Beam Exposure through Stencil Masks

Cacao, Eliedonna E., Nasrullah, Azeem, Sherlock, Tim, Kemper, Steven, Kourentzi, Katerina, Ruchhoeft, Paul, Stein, Gila E., Willson, Richard C., Chin, Wei-Chun
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Volume:
8
Language:
english
Journal:
PLoS ONE
DOI:
10.1371/journal.pone.0056835
Date:
May, 2013
File:
PDF, 3.16 MB
english, 2013
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