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High-Resolution, High-Throughput, Positive-Tone Patterning of Poly(ethylene glycol) by Helium Beam Exposure through Stencil Masks
Cacao, Eliedonna E., Nasrullah, Azeem, Sherlock, Tim, Kemper, Steven, Kourentzi, Katerina, Ruchhoeft, Paul, Stein, Gila E., Willson, Richard C., Chin, Wei-ChunVolume:
8
Language:
english
Journal:
PLoS ONE
DOI:
10.1371/journal.pone.0056835
Date:
May, 2013
File:
PDF, 3.16 MB
english, 2013