Preparation and properties of a-Si:H films by plasma CVD...

Preparation and properties of a-Si:H films by plasma CVD (glow discharge) method.

CHIGASAKI, Mitsuo
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Volume:
39
Year:
1988
Journal:
Journal of the Metal Finishing Society of Japan
DOI:
10.4139/sfj1950.39.375
File:
PDF, 802 KB
1988
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