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Amorphization of SiO2 Thin Films by Using 200 MeV Ag15+ Ions
Gaikwad, Anil, Mhaisagar, Yogesh, Gupta, Swati, Joshi, Bhavana, Asokan, Kandasami, Mahajan, AshokLanguage:
english
Journal:
Silicon
DOI:
10.1007/s12633-018-9882-4
Date:
June, 2018
File:
PDF, 1.19 MB
english, 2018