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Exploitation of semi-sequential reactive ion etch processes to fabricate in-plane Si structures
Zarei, Sanaz, Mohajerzadeh, ShamsVolume:
13
Language:
english
Journal:
Micro & Nano Letters
DOI:
10.1049/mnl.2017.0405
Date:
April, 2018
File:
PDF, 702 KB
english, 2018