Formation of Si Nano Hole Arrays Using a Self-assembled Nanolithography Mask and Cu Fill of the Array
KONDOH, Eiichi, TAMAI, Kakeru, MATSUMURA, MichioVolume:
64
Year:
2013
Journal:
Journal of The Surface Finishing Society of Japan
DOI:
10.4139/sfj.64.659
File:
PDF, 1.82 MB
2013