Atmospheric Pressure Deposition of Silica Thin Film by Photo-CVD Using Vacuum Ultraviolet Excimer Lamp
MAEZONO, Yoshinari, YOKOTANI, Atsushi, KUROSAWA, Kou, HISHINUMA, Nobuyuki, MATSUNO, HiromitsuVolume:
32
Year:
2004
Journal:
The Review of Laser Engineering
DOI:
10.2184/lsj.32.54
File:
PDF, 525 KB
2004