Dry etching process for fabrication of optoelectronic...

Electronics Letters 1991 Vol. 27; Iss. 24

Dry etching process for fabrication of optoelectronic gratings in III-V substrates

Gozdz, A.S., Shelburne, J.A., Robinson, R.S., Chang, C.C.
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Volume:
27
Year:
1991
Language:
english
Journal:
Electronics Letters
DOI:
10.1049/el:19911404
File:
PDF, 308 KB
english, 1991
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