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A Compound Semiconductor Process Simulator and its Application to Mask Dependent Undercut Etching
Kumagai, Masami, Yokoyama, Kiyoyuki, Tazawa, SatoshiVolume:
6
Year:
1998
Language:
english
Journal:
VLSI Design
DOI:
10.1155/1998/65787
File:
PDF, 1.76 MB
english, 1998