A Comparative Study of Selective Dry and Wet Etching of...

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Semiconductor Science and Technology 2018 / 06

A Comparative Study of Selective Dry and Wet Etching of Germanium−Tin (Ge1−xSnx) on Germanium

Han, Yi, Li, Yao Yao, Song, Yuxin, chi, chaodan, Zhang, Zhenpu, liu, juanjuan, Zhu, Zhongyunshen, Wang, Shumin
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Language:
english
Journal:
Semiconductor Science and Technology
DOI:
10.1088/1361-6641/aace43
Date:
June, 2018
File:
PDF, 2.01 MB
english, 2018
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