MOCVD Compatible Atomic Layer Deposition Process of Al2O3...

Materials Science Forum 2018 / 6 Vol. 924

MOCVD Compatible Atomic Layer Deposition Process of Al2O3 on SiC and Graphene/SiC Heterostructures

Eckstein, Marco, Koppka, Christian, Thiele, Sebastian, Mi, Yan, Xu, Rui, Lei, Yong, Hähnlein, Bernd, Schwierz, Frank, Pezoldt, Jörg
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Volume:
924
Language:
english
Journal:
Materials Science Forum
DOI:
10.4028/www.scientific.net/MSF.924.506
Date:
June, 2018
File:
PDF, 1.46 MB
english, 2018
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