Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
2015 / 09 Vol. 33; Iss. 5
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Correlation between dry etching resistance of Ta masks and the oxidation states of the surface oxide layers
Satake, Makoto, Yamada, Masaki, Li, Hu, Karahashi, Kazuhiro, Hamaguchi, SatoshiVolume:
33
Language:
english
Journal:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
DOI:
10.1116/1.4930242
Date:
September, 2015
File:
PDF, 1.74 MB
english, 2015