Deposition of the low resistive ITO-films by means of...

IOP Conference Series Materials Science and Engineering 2016 / 06 Vol. 135

Deposition of the low resistive ITO-films by means of reactive magnetron sputtering of the In/Sn target on the cold substrate

Zhidik, Y S, Troyan, P E, Baturina, E V, Korzhenko, D V, Yurjev, Y N
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Volume:
135
Language:
english
Journal:
IOP Conference Series: Materials Science and Engineering
DOI:
10.1088/1757-899X/135/1/012055
Date:
June, 2016
File:
PDF, 1.17 MB
english, 2016
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