Effect of substrate orientation on strain relaxation...

Japanese Journal of Applied Physics 2017 / 08 Vol. 56; Iss. 8S2

Effect of substrate orientation on strain relaxation mechanisms of InGaAs layer grown on vicinal GaAs substrates measured by in situ X-ray diffraction

Suzuki, Hidetoshi, Sasaki, Takuo, Takahasi, Masamitu, Ohshita, Yoshio, Kojima, Nobuaki, Kamiya, Itaru, Fukuyama, Atsuhiko, Ikari, Tetsuo, Yamaguchi, Masafumi
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
56
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.56.08MA06
Date:
August, 2017
File:
PDF, 833 KB
english, 2017
Conversion to is in progress
Conversion to is failed