TECHnology and APPLICATION OF IN-SITU ALO X LAYERS on...

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Applied Surface Science 2018 / 6

TECHnology and APPLICATION OF IN-SITU ALO X LAYERS on III-V semiconductors

Kúdela, R., Šoltýs, J., Kučera, M., Stoklas, R., Gucmann, F., Blaho, M., Mičušík, M., Pohorelec, O., Gregor, M., Brytavskyi, I., Dobročka, E., Gregušová, D.
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Language:
english
Journal:
Applied Surface Science
DOI:
10.1016/j.apsusc.2018.06.229
Date:
June, 2018
File:
PDF, 1.12 MB
english, 2018
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