Tunable Electron and Hole Injection Enabled by Atomically Thin Tunneling Layer for Improved Contact Resistance and Dual Channel Transport in MoS 2 /WSe 2 van der Waals Heterostructure
Khan, Muhammad Atif, Rathi, Servin, Lee, Changhee, Lim, Dongsuk, Kim, Yunseob, Yun, Sun Jin, Youn, Doo Hyeb, Kim, Gil-HoLanguage:
english
Journal:
ACS Applied Materials & Interfaces
DOI:
10.1021/acsami.8b05549
Date:
June, 2018
File:
PDF, 1011 KB
english, 2018