Chemical Vapor Deposition Carbon Film as a Capping Layer in...

Journal of Nanoscience and Nanotechnology 2018 / 09 Vol. 18; Iss. 9

Chemical Vapor Deposition Carbon Film as a Capping Layer in 4H-SiC Based MOSFETs

Choi, Kyeong-Keun, Lee, Jeong-Yoon, Lee, Won-Beom, Kim, Deok-Kee, Park, Chan-Gyung
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Volume:
18
Language:
english
Journal:
Journal of Nanoscience and Nanotechnology
DOI:
10.1166/jnn.2018.15573
Date:
September, 2018
File:
PDF, 10.95 MB
english, 2018
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