Deep oxidation of NO by a hybrid system of plasma-N type...

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Environmental Science & Technology 2018 / 07

Deep oxidation of NO by a hybrid system of plasma-N type semiconductor: High energy electron activated “pseudo photocatalysis” behavior

Chen, Si, Wang, Haiqiang, Shi, Mengpa, Ye, Haoling, Wu, Zhongbiao
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Language:
english
Journal:
Environmental Science & Technology
DOI:
10.1021/acs.est.8b00655
Date:
July, 2018
File:
PDF, 1.60 MB
english, 2018
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