High aspect ratio anisotropic silicon etching for x-ray phase contrast imaging grating fabrication
Finnegan, Patrick S., Hollowell, Andrew E., Arrington, Christian L., Dagel, Amber L.Language:
english
Journal:
Materials Science in Semiconductor Processing
DOI:
10.1016/j.mssp.2018.06.013
Date:
June, 2018
File:
PDF, 2.24 MB
english, 2018