Near-field scanning microscopy and physico-chemical...

  • Main
  • 2018 / 07
  • Near-field scanning microscopy and physico-chemical...
Plasma Processes and Polymers 2018 / 07

Near-field scanning microscopy and physico-chemical analysis versus time of SiCN:H thin films grown in Ar/NH3/TMS gas mixture using MW-Plasma CVD at 400 °C

Plujat, Béatrice, Glénat, Hervé, Hamon, Jonathan, Gazal, Yoan, Goullet, Antoine, Hernandez, Emmanuel, Quoizola, Sébastien, Thomas, Laurent
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Language:
english
Journal:
Plasma Processes and Polymers
DOI:
10.1002/ppap.201800066
Date:
July, 2018
File:
PDF, 2.86 MB
english, 2018
Conversion to is in progress
Conversion to is failed