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Using HCl to Control Silver Dissolution in Metal-Assisted Chemical Etching of Silicon
Williams, Max O., Jervell, Ada L. H., Hiller, Daniel, Zacharias, MargitLanguage:
english
Journal:
physica status solidi (a)
DOI:
10.1002/pssa.201800135
Date:
July, 2018
File:
PDF, 1.18 MB
english, 2018