[IEEE 2018 China Semiconductor Technology International Conference (CSTIC) - Shanghai (2018.3.11-2018.3.12)] 2018 China Semiconductor Technology International Conference (CSTIC) - STI scratch defects reduction by using solid pad in 1X technology node
Chen, Kuang-Wei, Chen, Yen-Ting, Chen, Chun-Fu, Luoh, Tuung, Yang, Lin-Wuu, Yang, Ta-Hone, Chen, Kuang-Chao, Tay, Yuchi, Chen, Yi Ming, Ton, Johnson, Lu, Yen PinYear:
2018
Language:
english
DOI:
10.1109/CSTIC.2018.8369263
File:
PDF, 509 KB
english, 2018