A Multilevel Zero-Inflated Model for the Study of Copper Hillocks Growth in Integrated Circuits Manufacturing
Li, Guilin, Tan, Royston K.G., Ng, Szu Hui, Chua, Daniel H.C.Year:
2018
Language:
english
Journal:
IEEE Transactions on Semiconductor Manufacturing
DOI:
10.1109/TSM.2018.2853800
File:
PDF, 2.25 MB
english, 2018