[IEEE 2018 29th Annual SEMI Advanced Semiconductor...

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[IEEE 2018 29th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Saratoga Springs, NY, USA (2018.4.30-2018.5.3)] 2018 29th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Innovative use of FA techniques SCM and OBIRCH along with TCAD to resolve junction scaling issues at advanced technology nodes

Johnson, Gregory, Nxumalo, Jochonia, Arya, Ankur, Johnson, Jeffrey, Gao, Qun, Greene, Brian
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Year:
2018
Language:
english
DOI:
10.1109/asmc.2018.8373206
File:
PDF, 974 KB
english, 2018
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