Tough and antifouling antireflection structures made by...

Microelectronic Engineering 2018 / 10 Vol. 197

Tough and antifouling antireflection structures made by partial-filling ultraviolet nanoimprint lithography

Eto, Hikari, Hiwasa, Shin, Taniguchi, Jun
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Volume:
197
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2018.04.017
Date:
October, 2018
File:
PDF, 2.40 MB
english, 2018
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