Target Voltage Hysteresis Behavior and Control Point in the Preparation of Aluminum Oxide Thin Films by Medium Frequency Reactive Magnetron Sputtering
Wang, Qingfu, Fang, Liping, Liu, Qinghe, Chen, Lin, Wang, Qinguo, Meng, Xiandong, Xiao, HongVolume:
8
Language:
english
Journal:
Coatings
DOI:
10.3390/coatings8040146
Date:
April, 2018
File:
PDF, 10.35 MB
english, 2018