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Effect of the SiCl4 Flow Rate on SiBN Deposition Kinetics in SiCl4-BCl3-NH3-H2-Ar Environment
Li, Jianping, Qin, Hailong, Liu, Yongsheng, Ye, Fang, Li, Zan, Cheng, Laifei, Zhang, LitongVolume:
10
Language:
english
Journal:
Materials
DOI:
10.3390/ma10060627
Date:
June, 2017
File:
PDF, 3.46 MB
english, 2017