Hard-Baked Photoresist as a Sacrificial Layer for Sub-180...

Micromachines 2018 / 05 Vol. 9; Iss. 5

Hard-Baked Photoresist as a Sacrificial Layer for Sub-180 °C Surface Micromachining Processes

Tawfik, Hani, Elsayed, Mohannad, Nabki, Frederic, El-Gamal, Mourad
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Volume:
9
Language:
english
Journal:
Micromachines
DOI:
10.3390/mi9050231
Date:
May, 2018
File:
PDF, 4.12 MB
english, 2018
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