Postdeposition annealing on VO 2 films for resistive random-access memory selection devices
Lim, Heewoo, Cho, Haewon, Kim, Hyunjung, Lee, Namgue, Shin, Seokyoon, Jung, Chanwon, Kim, Hyunjun, Lim, Kyungpil, Jeon, HyeongtagVolume:
36
Language:
english
Journal:
Journal of Vacuum Science & Technology A
DOI:
10.1116/1.5021082
Date:
September, 2018
File:
PDF, 2.65 MB
english, 2018