Tin Diffusion from Doped Oxides for Fabricating GaAs...

Tin Diffusion from Doped Oxides for Fabricating GaAs Microwave Devices

Arnold, Norbert, Daembkes, Heinrich, Heime, Klaus
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Volume:
19
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAPS.19S1.361
Date:
January, 1980
File:
PDF, 560 KB
1980
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