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A Chemical Perspective of GaN Polarity: The use of Hydrogen Plasma Dry Etching Versus NaOH Wet Etching to Determine Polarity
Losurdo, Maria, Giangregorio, MariaMichela, Capezzuto, Pio, Bruno, Giovanni, Namkoong, Gon, Doolittle, W. Alan, Brown, April S.Volume:
722
Year:
2002
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/PROC-722-K3.4
File:
PDF, 1.20 MB
english, 2002