Investigation of reaction sequence occurring in...

Materials Science in Semiconductor Processing 2018 / 11 Vol. 87

Investigation of reaction sequence occurring in graphene-assisted chemical etching of Ge surfaces in water

Li, Shaoxian, Nakade, Kazuki, Hirano, Tomoki, Kawai, Kentaro, Arima, Kenta
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Volume:
87
Language:
english
Journal:
Materials Science in Semiconductor Processing
DOI:
10.1016/j.mssp.2018.07.009
Date:
November, 2018
File:
PDF, 1.11 MB
english, 2018
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