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[IEEE 2018 29th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Saratoga Springs, NY, USA (2018.4.30-2018.5.3)] 2018 29th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - STI HARP gap-fill thickness uniformity improvement for 14nm nodes
Wang, Minrui, Kim, Hui, Lee, Yang Bum, Fonda, Francis, Lansford, Jeremy, Martiniano, Jim, Carter, HaroldYear:
2018
Language:
english
DOI:
10.1109/ASMC.2018.8373207
File:
PDF, 520 KB
english, 2018