Effect of varying plasma properties on III-nitride film...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 2018 / 09 Vol. 36; Iss. 5

Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy

Boris, David R., Anderson, Virginia R., Nepal, Neeraj, Johnson, Scooter D., Robinson, Zachary R., Kozen, Alexander C., Eddy, Charles R., Walton, Scott G.
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Volume:
36
Language:
english
Journal:
Journal of Vacuum Science & Technology A
DOI:
10.1116/1.5034247
Date:
September, 2018
File:
PDF, 1.96 MB
english, 2018
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