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Sputtering Power Induced Physical Property Variation of Nickel Oxide Films by Radio Frequency Magnetron Sputtering
Zhao, Yang, Wang, Hui, Yang, Fan, Wang, Zhiyuan, Li, Jingjie, Gao, Yutao, Feng, Zhennan, Li, Xinzhong, Zhen, ZhiqiangVolume:
21
Language:
english
Journal:
Materials Research
DOI:
10.1590/1980-5373-mr-2017-0836
Date:
February, 2018
File:
PDF, 1.36 MB
english, 2018