Multiscale Simulation of the Development Process in...

Journal of Photopolymer Science and Technology 2017 Vol. 30; Iss. 2

Multiscale Simulation of the Development Process in Electron Beam Lithography

Yasuda, Masaaki, Hitomi, Sho, Kawata, Hiroaki, Hirai, Yoshihiko
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Volume:
30
Year:
2017
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.30.205
File:
PDF, 4.54 MB
english, 2017
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