Gas Phase Chemistry Study During Deposition of a-Si:H and...

MRS Proceedings 2002 Vol. 715

Gas Phase Chemistry Study During Deposition of a-Si:H and μc-Si:H Films by HWCVD using Quadrupole Mass Spectrometry

Patil, Samadhan B., Kumbhar, Alka A., Dusane, R. O.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
715
Year:
2002
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/PROC-715-A23.5
File:
PDF, 111 KB
english, 2002
Conversion to is in progress
Conversion to is failed