Formation of stable Si–O–C submonolayers on hydrogen-terminated silicon(111) under low-temperature conditions
Khung, Yit Lung, Ngalim, Siti Hawa, Scaccabarozzi, Andrea, Narducci, DarioVolume:
6
Language:
english
Journal:
Beilstein Journal of Nanotechnology
DOI:
10.3762/bjnano.6.3
Date:
January, 2015
File:
PDF, 1.00 MB
english, 2015