Effects of thermal contact resistance on film growth rate in a horizontal MOCVD reactor
Ik-Tae Im, Nag Jung Choi, Masakazu Sugiyama, Yoshiyaki Nakano, Yukihiro Shimogaki, Byoung Ho Kim, Kwang-Sun KimVolume:
19
Language:
english
Pages:
9
DOI:
10.1007/bf02984054
Date:
June, 2005
File:
PDF, 686 KB
english, 2005