Effects of thermal contact resistance on film growth rate...

Effects of thermal contact resistance on film growth rate in a horizontal MOCVD reactor

Ik-Tae Im, Nag Jung Choi, Masakazu Sugiyama, Yoshiyaki Nakano, Yukihiro Shimogaki, Byoung Ho Kim, Kwang-Sun Kim
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Volume:
19
Language:
english
Pages:
9
DOI:
10.1007/bf02984054
Date:
June, 2005
File:
PDF, 686 KB
english, 2005
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