![](/img/cover-not-exists.png)
Annealing of deposited SiO_2 thin films: full-atomistic simulation results
Grigoriev, F.V., Katkova, E.V., Sulimov, A.V., Sulimov, V.B., Tikhonravov, A.V.Volume:
6
Language:
english
Journal:
Optical Materials Express
DOI:
10.1364/OME.6.003960
Date:
December, 2016
File:
PDF, 2.00 MB
english, 2016