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Precision measurement of X-axis stage mirror profile in scanning beam interference lithography by three-probe system based on bidirectional integration model
Liu, Zhaowu, Jiang, Shan, Li, Xiaotian, Song, Ying, Li, Wenhao, Bayanheshig,Volume:
25
Language:
english
Journal:
Optics Express
DOI:
10.1364/oe.25.010312
Date:
May, 2017
File:
PDF, 3.24 MB
english, 2017