Argon plasma etching of fused silica substrates for manufacturing high laser damage resistance optical interference coatings
Juškevičius, Kęstutis, Buzelis, Rytis, Abromavičius, Giedrius, Samuilovas, Romanas, Abbas, Saulė, Belosludtsev, Alexandr, Drazdys, Ramutis, Kičas, SimonasVolume:
7
Language:
english
Journal:
Optical Materials Express
DOI:
10.1364/ome.7.003598
Date:
October, 2017
File:
PDF, 2.90 MB
english, 2017