Comparative Investigation of Flat-Band Voltage Modulation by Nitrogen Plasma Treatment for Advanced HKMG Technology
Yao, Jiaxin, Yin, Huaxiang, Wu, Zhenhua, Gao, Jianfeng, Zhang, Qingzhu, Hou, Zhaozhao, Gu, Jie, Luo, KunVolume:
7
Year:
2018
Language:
english
Journal:
ECS Journal of Solid State Science and Technology
DOI:
10.1149/2.0221808jss
File:
PDF, 1.07 MB
english, 2018