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Improvement of the electrical contact resistance at rough interfaces using two dimensional materials
Hu, Jianchen, Pan, Chengbin, Li, Heng, Shen, Panpan, Sun, Hui, Duan, Huiling, Lanza, MarioVolume:
118
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.4936366
Date:
December, 2015
File:
PDF, 2.56 MB
english, 2015