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[IEEE 2018 IEEE 30th International Symposium on Power Semiconductor Devices and ICs (ISPSD) - Chicago, IL (2018.5.13-2018.5.17)] 2018 IEEE 30th International Symposium on Power Semiconductor Devices and ICs (ISPSD) - A novel divided STI-based nLDMOSFET for suppressing HCI degradation under high gate bias stress
Mori, Takahiro, Kubo, Shunji, Ipposhi, TakashiYear:
2018
Language:
english
DOI:
10.1109/ispsd.2018.8393662
File:
PDF, 1.10 MB
english, 2018