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Direct metal etch of ruthenium for advanced interconnect

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 2018 / 05 Vol. 36; Iss. 3

Direct metal etch of ruthenium for advanced interconnect

Paolillo, Sara, Wan, Danny, Lazzarino, Frédéric, Rassoul, Nouredine, Piumi, Daniele, Tőkei, Zsolt
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Volume:
36
Language:
english
Journal:
Journal of Vacuum Science & Technology B
DOI:
10.1116/1.5022283
Date:
May, 2018
File:
PDF, 2.45 MB
english, 2018
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