Low-stress and high-reflectance Mo/Si multilayers for extreme ultraviolet lithography by magnetron sputtering deposition with bias assistance
Yu, Bo, Jin, Chunshui, Yao, Shun, Li, Chun, Liu, Yu, Zhou, Feng, Guo, Benyin, Wang, Hui, Xie, Yao, Wang, LipingVolume:
56
Language:
english
Journal:
Applied Optics
DOI:
10.1364/AO.56.007462
Date:
September, 2017
File:
PDF, 1006 KB
english, 2017