Metal work function engineering on epitaxial (100)Ge and...

Microelectronic Engineering 2018 / 11 Vol. 199

Metal work function engineering on epitaxial (100)Ge and (110)Ge metal-oxide-semiconductor devices

Nguyen, Peter D., Clavel, Michael B., Ghosh, Aheli, Hudait, Mantu K.
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Volume:
199
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2018.07.018
Date:
November, 2018
File:
PDF, 2.09 MB
english, 2018
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