Study of Porous Silica Based Films as Low-k Dielectric...

MRS Proceedings 2002 Vol. 716

Study of Porous Silica Based Films as Low-k Dielectric Material and their Interface with Copper Metallization

Fisher, Ilanit, Kaplan, Wayne D., Eizenberg, Moshe, Nault, Michael, Weidman, Timothy
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
716
Year:
2002
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/PROC-716-B7.20
File:
PDF, 179 KB
english, 2002
Conversion to is in progress
Conversion to is failed