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Photoemission study on electrical dipole at SiO 2 /Si and HfO 2 /SiO 2 interfaces
Fujimura, Nobuyuki, Ohta, Akio, Ikeda, Mitsuhisa, Makihara, Katsunori, Miyazaki, SeiichiVolume:
56
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.56.04CB04
Date:
April, 2017
File:
PDF, 2.06 MB
english, 2017